MEMS & Nanotechnology
CAD Translation for MEMS & Nanotechnology
MEMS and nanotechnology engineers rely on LinkCAD to convert between CIF, GDSII, DXF and other mask layout formats. Clean up geometry, repair broken polygons and prepare layouts for fabrication β all in one tool.
Why MEMS Engineers Choose LinkCAD
Solve Common MEMS Translation Challenges
CIF β DXF Conversion
Convert university-standard CIF mask drawings to DXF for commercial fabrication, or DXF back to CIF. LinkCAD supports all known CIF variations, including Cle CIF2.0+.
GDSII Mask Layouts
Import and export GDSII files, the de-facto standard for IC and MEMS mask data. Preserve cell hierarchies, layer information and polygon data.
Geometry Repair
Fix self-intersecting polygons, merge overlapping shapes, join broken wires and auto-detect holes β critical for clean mask data.
Polygon Merging
Merge overlapping polygons to prevent over-exposure during lithographic mask fabrication. Optionally keep original polygon outlines.
PostScript Mask Output
Generate optimized PostScript output for producing low-cost masks using high-resolution laser printers.
Batch Automation
Automate repetitive mask conversions using the command line or Python scripting for production workflows.
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